Gallium Nitride Epitaxy Equipment
Brand
SiCCESS®
Epitaxy Specification
8”/6” compatible, with multiple types of substrates
Category
Gallium Nitride Epitaxy Equipment
Product Accessories
Detailed Introduction
▍Technical Advantages
Our independently-developed high-performance GaN epitaxy equipment boasts high throughput, well suited for future market demand, and features high epitaxial uniformity, low defect rates, low operating cost, long maintenance intervals, and easy maintenance.
▍Process Features
High throughput
8”/6” compatible
Long trouble-free operations
Excellent thickness and composition uniformity of epitaxial layers
Mass production with low operating cost
High degree of automation
24*7 mass production
Compatible with multiple substrate types
Address
中国江苏省苏州市工业园区苏慕路100号
No.100, Sumu Road, Suzhou Industrial Park, Suzhou, Jiangsu, China
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